Effectiveness of Ultrasonic Cleaning of Aluminum Base Plates and Top Covers in the Removal of Particles Using VALTRON® DP155 - Valtech Corporation
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Effectiveness of Ultrasonic Cleaning of Aluminum Base
Plates and Top Covers in the Removal of Particles
Using Valtron DP155

I. Purpose

The purpose of this test was to determine the effectiveness of the VALTRON® DP155 nonionic surfactant in the removal of particles from aluminum base plates and top covers. The effectiveness of this product will be compared to that of Triton X-100 nonionic surfactant.

 

II. Parameters of the Experiment

  1. Conditioning of the Substrates:
    Five (5) aluminum disk drive base plates and 5 aluminum disk drive top covers were submitted for evaluation. No initial conditioning was performed.
  2. Ultrasonic Cleaning Equipment:
    The ultrasonic system utilized for the cleaning experiment was manufactured by 5X Corporation.  The ultrasonic transducers were manufactured by Branson Ultrasonics Corporation, Danbury, CT, USA.

 

III. The Experiment

  1. The ultrasonic cleaning equipment was configured as shown in the table below.

      Tank 1
    Wash
    Tank 2
    Wash
    Tank 3
    Rinse
    Tank 4
    Rinse
    Tank 5
    Rinse
    Tank 6
    Rinse
    Dry
    HEPA
    Frequency (kHz) 40 68 68 68 68 400 --
    Time (sec) 90 90 90 90 90 90 800
    Temperature (°C) 45 45 45 45 45 45 85
    Power (%) 10 25 25 25 25 25  
    Tank Size (Gallons) 35 35 35 35 35 35  

    Additional Details:
    Power = Watts (1500 / Tank)
    Rinse water filtered using 0.1 micron filtration
    Dryer with Hepafilter @ 85°C for 800 seconds

  2. Environment:
    Class 10,000 Clean Room

    Preparation of Detergent Solutions:
    0.02% by volume of detergent was prepared.
    Detergent baths were degassed for 5 minutes prior to cleaning.

    Following cleaning of the base plates and top covers were submitted for Liquid Particle Count (LPC) Analysis

  3. Particle Measurement
    A LPC Analysis was conducted using Particle Counter Model # CLS-700 manufactured by Particle Measuring Systems.
    The results are listed below:

IV. Results

TOP COVER
Particle Size Control Triton
X-100
Triton
X-100
Triton
X-100
DP155 DP155 DP155
    # 1 # 2 Average # 1 # 2 Average
> 0.2 µm 2,200,000 3,100,000 1,900,000 2,500,000 1,500,000 580,000 1,040,000
> 0.3 µm 850,000 850,000 710,000 780,000 820,000 250,000 535,000
0.5 µm 180,000 200,000 170,000 185,000 260,000 75,000 167,500
1.0 µm 24,000 27,000 16,000 21,500 4,900 6,000 5,450
2.0 µm 3,000 3,000 1,400 2,200 280 1,000 640

BASE PLATE
Particle Size Control Triton
X-100
Triton
X-100
Triton
X-100
DP155 DP155 DP155
    # 1 # 2 Average # 1 # 2 Average
> 0.2 µm 8,700,000 21,000,000 20,000,000 20,500,000 3,100,000 33,000,000 18,050,000
> 0.3 µm 2,700,000 7,000,000 6,900,000 6,950,000 1,200,000 11,000,000 6,100,000
0.5 µm 600,000 1,600,000 1,500,000 1,550,000 270,000 2,500,000 1,385,000
1.0 µm 82,000 240,000 210,000 225,000 38,000 310,000 174,000
2.0 µm 7,900 18,000 35,000 26,500 3,000 37,000 20,000

 

V. Conclusion

In reviewing the LPC data, the particle counts of the top covers and base plates cleaned using the DP155 nonionic surfactant yielded reduced LPC counts. This data suggests the lower surface tension of the DP155 offers an improvement of the current industry standard used in top cover and base plate cleaning.

 

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Compatibility Testing of Lenses | Removal of DYKEM Layout Fluid | Removal of Polishing Compounds
Removal of Contaminants | Effectiveness of Ultrasonic Cleaning | Etching of Silicon Wafers | De-bonding of Silicon Wafers
De-bonding and Removal of Wax |Removal of AquaBond 55 & 85 | De-bonding of AD4110-A/AD4105-B

 

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